Alcatel SCM650

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ALCATEL SCM 650
Sputter – Anlage

APPLICATION: RF / DC sputtering. (with or without bias):   Ionic cleaning.
CATHODES: 2 magnetron targets 200mm diameter.
SUBSTRATE TRANSPORT LOAD LOCK: for 150mm diameter substrates.
SUBSTRATE HOLDER:
4 stations.
6 indexed positions
4 transfer + 2 sputtering positions)
Continuous rotation 1 to 30 r.p.m.
Vertical translation 50 to 100mm
SHUTTER: One 3/4 automatic shutter.
GENERATORS:
1 RF-Generator (2000 W) for the targets 1 and 2 and the substrate-holder
1 DC-Generator (3000 W) for the targets 1 and 2
GAS LINES: 2 lines
DIMENSIONS:
Width 2970mm. : Height 1930mm.: Depth 1800 mm

GENERATORS:
1 RF-Generator (2000 W) for the targets 1 and 2 and the substrate-holder
1 DC-Generator (3000 W) for the targets 1 and 2
GAS LINES: 2 lines
DIMENSIONS:
Width 2970mm. : Height 1930mm.: Depth 1800 mm

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